< Nanotechnology
| Navigate |
|---|
| << Prev: Self assembly |
| >< Main: Nanotechnology |
| >> Next: Nanomanipulation |
|
|
| Down: Module on EBID |
Lithography
Electron beam lithography
Nano imprint lithography (NIL)
Focused Ion Beam Techniques
Electron Beam Induced Deposition (EBID or EBD)
The highly focused electron beam in a SEM is used for imaging nanostructures, but it can also be used to make nanoscale deposits. In the presence of carbonaceous or organometallic gasses in the SEM chamber, electron beam induced deposition (EBID or electron beam deposition (EBD)) can be used to construct three-dimensional nanostructures or solder/glue nanostructures.
References
See also notes on editing this book about how to add references Nanotechnology/About#How_to_contribute.
This article is issued from Wikibooks. The text is licensed under Creative Commons - Attribution - Sharealike. Additional terms may apply for the media files.